THIN-FILM PRODUCTS

  • Hafnium sputtering target
Hafnium sputtering target

Hafnium sputtering target

  • Purity: 99.9-99.999% available
  • ASTM B391-2018
  • Rectangular, Wafer, Tube, etc.
  • Customization supported
  • Product description: SRT supply various Hafnium sputtering target, Hafnium target
  • INQUIRY


Hafnium (Hf) Series Sputtering Target/Cathode
Item Material Purities Application
Hf Hafnium 99.9-99.99% Electronics, Semiconductor
Other Hf Hafnium / Hafnium alloy * Other
  • Purity: 99.9 - 99.99%
  • Standards: ASTM   GB/T  ISO
  • Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.
  • Backing plate and supporter: To provide specifications of aluminum supporter, Molybdenum supporter, copper supporter, Titanium supporter.
  • Services
  • Target metallization services
  • Target bonding services.

YS/T 1239-2018 High purity Hafnium
YS/T 1140-2016
Hafnium oxide

Hafnium sputtering target, Hafnium target
smelting
Hafnium Sputtering target Forming (Smelting, Powder metallurgy)
Inspection Machining
Inspection Machining
Analysis Microstructure
Analysis Microstructure
Surface Surface
Surface Quality Surface Quality
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode
Sputtering target and Cathode

CONTACT US

Contact: Sales Dept.

Phone: (86) 186 0101 9114 (ER only)

Tel: (86) 10-52868200/01/02/03

Email: sales@sinomaterial.com

Add: 5-301, Lincui West Road, Chaoyang, Beijing China