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Hafnium sputtering target

Hafnium sputtering target

Purity: 99.9-99.999% available
ASTM B391-2018
Rectangular, Wafer, Tube, etc.
Customization supported
Product description: SRT supply various Hafnium sputtering target, Hafnium target
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Hafnium (Hf) Series Sputtering Target/Cathode
Item	Material	Purities	Application
Hf	Hafnium	99.9-99.99%	Electronics, Semiconductor
Other Hf	Hafnium / Hafnium alloy	*	Other
Purity: 99.9 - 99.99% Standards: ASTM GB/T ISO Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored. Backing plate and supporter: To provide specifications of aluminum supporter, Molybdenum supporter, copper supporter, Titanium supporter. Services Target metallization services Target bonding services.

YS/T 1239-2018	High purity Hafnium
YS/T 1140-2016	Hafnium oxide


Hafnium Sputtering target	Forming (Smelting, Powder metallurgy)

Inspection	Machining

Analysis	Microstructure

Surface Quality	Surface Quality

Sputtering target and Cathode	Sputtering target and Cathode

Sputtering target and Cathode	Sputtering target and Cathode

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Contact: Sales Dept.

Phone: (86) 186 0101 9114 (ER only)

Tel: (86) 10-52868200/01/02/03

Email: sales@sinomaterial.com

Add: 5-301, Lincui West Road, Chaoyang, Beijing China

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