| Tantalum (Ta) Series Sputtering Target/Cathode | |||
| Item | Material | Purities | Application |
| Ta | Tantalum | 99.9-99.99% | Electonics, Smiconductor, Display |
| TaAl | Tantalum Aluminum | 99.95-99.99% |
Electonics, Smiconductor, Display |
| Other Ta | Tantalum and alloys | 99.0-99.95% | Others |
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| ASTM B365-2012 | Standard Specification for Tantalum and Tantalum Alloy Rod and Wire |
| ASTM B521-2012 | Standard Specification for Tantalum and Tantalum Alloy Seamless and Welded Tubes |
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ASTM B708-2012 |
Standard
Specification for Tantalum and Tantalum Alloy Plate, Sheet, and Strip |
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ASTM B364-2018 |
Standard
Specification for Tantalum and Tantalum Alloy Ingots |
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YS/T 751-2011 |
Designation and
composition of tantalum and tantalum alloy |
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YS/T 1024-2015 |
Tantalum sputtering
targets |
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GB/T 3629-2017 |
Tantalum and tantalum
alloy sheet,strip and foil |
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GB/T 8182-2008 |
Tantalum and tantalum
alloy seamless tubes |
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| Tantalum Sputtering target | Forming (Smelting, Powder metallurgy) |
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| Inspection | Machining |
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| Analysis | Microstructure |
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| Surface Quality | Surface Quality |
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| Sputtering target and Cathode |
Sputtering target and Cathode |
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Sputtering target and Cathode |
Sputtering target and Cathode |
Contact: Sales Dept.
Phone: (86) 186 0101 9114 (ER only)
Tel: (86) 10-52868200/01/02/03
Email: sales@sinomaterial.com
Add: 5-301, Lincui West Road, Chaoyang, Beijing China
Sputtering target
kogin